
- 作 者:RICHARD W.ROBERTS AND THOMAS A.VANDERSLICE
- 出 版 社:INC.
- 出版年份:1963
- ISBN:
- 标注页数:199 页
- PDF页数:216 页
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1 Ultrahigh Vacuum Technology 2
1-1 Introduction, 2
1-2 The History of Ultrahigh Vacuum Technology, 5
2 Ultrahigh Vacuum Components 7
2-1 Introduction, 8
2-2 Fundamental Vacuum System Con-siderations, 8
2-3 Pumps for Ultrahigh Vacuum, 10
2-4 Gauges for Ultrahigh Vacuum Measurement, 30
2-5 Bakeable Gauges for Pressures 10-5 Torr, 50
2-6 Valves for Ultrahigh Vacuum, 58
2-7 Accessories for Ultrahigh Vacuum, 62
3 Material of Construction 83
3-1 Introduction, 84
3-2 Glass, 95
3-3 Ceramic Refractory Materials, 105
3-4 Metals, 109
4 Ultrahigh Vacuum Systems 122
4-1 Introduction, 122
4-2 Assembly, 122
4-3 Typical Systems, 125
4-4 Leak Detection, 130
4-5 Operation, 131
5 Generation of Clean Surfaces 135
5-1 Introduction, 136
5-2 Evaporation, 137
5-3 High Temperature Heating of Bulk Metal, 142
5-4 Ion Bombardment (Sputtering) 143
5-5 Cleaving of Single Crystals, 144
5-6 Field Desorption, 145
6 Physical Properties of Surfaces 148
6-1 Introduction, 148
6-2 Thermionic and Field Emission from Surfaces, 148
6-3 Field Emission and Field Ion Mi-croscopes, 153
6-4 Low Energy Electron Diffraction, 157
6-5 Electron Emission by Ions and Electrons, 161
6-6 Flash Filament Experiments, 165
7 Miscellaneous Applications 174
7-1 Physical and Chemical Properties of Thin Films, 174
7-2 Boundary Lubrication of Metals, 177
7-3 Space Simulation, 179
Appendix-General References 186
A Ultrahigh Vacuum References, 186
B General Vacuum References, 186
C Journals, 187
Index 188
A Name Index, 189
B Subject Index, 193